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HS-/KN-Geltungsbereichs-Bibliothek
Code-Referenzkernreaktoren, kessel, maschinen, apparate und mechanische geräte; teile davon

Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)

Quellendatierte Referenz für den HS-/KN-Code 84199080: EUDR-Geltungsbereichsgrundlage, KN-Hierarchie, Auswirkungen auf die Nachweise und verwandte indexierte Zeilen.

ReferenztypHS-/KN-Geltungsbereichseintrag
Geltungsbereichs-EntscheidungOut of scope
Bedeutung für ImporteureNur Referenzhinweis
KN-Jahr2026
Referenzantwort

HS-/KN-Code 84199080 ist für die EUDR-Vorbereitung außerhalb des Geltungsbereichs.

Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001) Die indexierte Scope-Engine liefert für diesen Code das Ergebnis Out of scope. No Annex I scope match was found for this indexed CN code.

Geltungsbereichsgrundlage

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Code-Beschreibung
Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)
Anhang-I-Grundlage
Kein direkter Anhang-I-Eintrag
Quellengrundlage
Regulation (EU) 2023/1115 Annex I and CN 2026 index
KN-Hierarchie

Übergeordnete, untergeordnete und benachbarte Zeilen.

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Nachweismuster

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Quellen-Metadaten
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84199080 EUDR-HS-/KN-Geltungsbereichsreferenz | EUDR Tools