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HS/CN-soveltamisalakirjasto
Koodihakemistoryhmä - ydinreaktorit, höyrykattilat, koneet ja mekaaniset laitteet; niiden osat

Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)

Lähteellä päivätty hakemisto HS/CN-koodille 84199080, sen EUDR-soveltamisalan perusteelle, CN-hierarkialle, näyttövaikutuksille ja liittyville indeksoiduille riveille.

ViitetyyppiHS/CN-soveltamisalatietue
SoveltamisalapäätösOut of scope
Vaikutus maahantuojalleVain viitemuistiinpano
CN-vuosi2026
Viitevastaus

HS/CN-koodi 84199080 on soveltamisalan ulkopuolella EUDR-valmistelun kannalta.

Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001) Indeksoitu soveltamisalamoottori palauttaa arvon Out of scope tälle koodille. No Annex I scope match was found for this indexed CN code.

Soveltamisalan peruste

Miksi tämä hakemistosivu antaa tämän vastauksen.

Koodin kuvaus
Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)
Liite I -peruste
Ei suoraa liite I -merkintää
Lähdeperuste
Regulation (EU) 2023/1115 Annex I and CN 2026 index
CN-hierarkia

Yläkoodi, alakoodit ja lähirivit.

Kirjastonäkymä on tarkoitettu viitenavigointiin. Käytä tarkistinta, kun haluat suorittaa toisen koodin toimintona.

Näyttömalli

Mitä tämä tarkoittaa valmistelun kannalta.

Tämä rivi ei ole suora näytönkeruun laukaisin nykyisessä soveltamisalatuloksessa.

Lähdemetatiedot
Tarvitsetko nopean toimintonäkymän?Suorita sama koodi HS-soveltamisalan tarkistimessa.
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84199080 EUDR HS/CN-soveltamisalan hakemisto | EUDR Tools