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Leabharlann raoin HS/CN
Tagairt chóidimoibreoirí núicléacha, coirí, innealra agus fearais mheicniúla; páirteanna díobh sin

Parts of medical, surgical or laboratory sterilizers and of apparatus for rapid heating, for chemical vapour deposition and for physical vapour deposition by electronic beam or evaporation, on semiconductor wafers, n.e.s.

Tagairt dar dáta foinse le haghaidh chóid HS/CN 84199025, a bhunús raoin don EUDR, a ailtireacht CN, a impleachtaí fianaise, agus na rónanna gaolmhara inneacsaithe.

Cineál tagarthaTaifead raoin HS/CN
Cinneadh raoinOut of scope
Implication allmhaireoraNóta tagartha amháin
Bliain CN2026
Freagra tagartha

Tá cód HS/CN 84199025 as an raon le haghaidh ullmhaithe an EUDR.

Parts of medical, surgical or laboratory sterilizers and of apparatus for rapid heating, for chemical vapour deposition and for physical vapour deposition by electronic beam or evaporation, on semiconductor wafers, n.e.s. Cuireann inneacs an raoin Out of scope ar fáil don chód seo. No Annex I scope match was found for this indexed CN code.

Bunús an raoin

Cén fáth a thugann an leathanach tagartha seo an freagra sin.

Cur síos an chóid
Parts of medical, surgical or laboratory sterilizers and of apparatus for rapid heating, for chemical vapour deposition and for physical vapour deposition by electronic beam or evaporation, on semiconductor wafers, n.e.s.
Bunús Iarscríbhinn I
Níl iontráil dhíreach in Iarscríbhinn I
Bunús an fhoinse
Regulation (EU) 2023/1115 Annex I and CN 2026 index
Ailtireacht CN

Rónanna máthairthe, linte, agus rónanna gar.

Tá an féachán leabharlann le haghaidh nascleanúint tagartha. Bain úsáid as an scrúdóir nuair is mian leat cód eile a rith mar ghníomh.

84imoibreoirí núicléacha, coirí, innealra agus fearais mheicniúla; páirteanna díobh sinout8419machinery, plant or laboratory equipment whether or not electrically heated (excl. furnaces, ovens and other equipment of heading 8514), for the treatment of materials by a process involving a change of temperature such as heating, cooking, roasting, distilling, rectifying, sterilising, pasteurising, steaming, drying, evaporating, vaporising, condensing or cooling (excl. those used for domestic purposes); instantaneous or storage water heaters, non-electric; parts thereofout841990parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s.out84199010parts of heat-exchange units, for use in civil aircraft, n.e.s.out84199015parts of medical, surgical or laboratory sterilizers, n.e.s.out84199020parts for sterilizers of subheading 8419.20.00, n.e.s.out84199030parts of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation, on semiconductor wafers, n.e.s.out84199050parts of apparatus for chemical vapour deposition on lcd substrates, n.e.s.out84199080parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on lcd substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on lcd substrates)(1998-2001)out
Patrún fianaise

Cad a chiallann sé seo don ullmhú.

Ní é an rón seo spreisg bhailithe fianaise dhíreach sa toradh raoin reatha.

Meiteashonraí foinse
Teastaíonn leat an féachán tapa gníomhaíochta?Rith an cód céanna seo i Scrúdóir Raoin HS.
Oscail toradh an uirlis
Tagairt raon HS/CN 84199025 an EUDR | EUDR Tools