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Knjižnica HS/CN područja primjene
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Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)

Vremenski označena referenca za HS/CN oznaku 84199080, njezinu osnovu za EUDR područje primjene, CN hijerarhiju, implikacije za dokaze i povezane indeksirane redke.

Vrsta referenceZapis HS/CN područja primjene
Odluka o području primjeneOut of scope
Implikacija za uvoznikaSamo referentna bilješka
CN godina2026
Referentni odgovor

HS/CN oznaka 84199080 je izvan područja primjene za EUDR pripremu.

Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001) Indeksirani motor za provjeru područja primjene za ovu oznaku vraća Out of scope. No Annex I scope match was found for this indexed CN code.

Osnova područja primjene

Zašto ova referentna stranica daje takav odgovor.

Opis oznake
Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)
Osnova iz Priloga I
Nema izravnog unosa u Prilogu I
Izvorna osnova
Regulation (EU) 2023/1115 Annex I and CN 2026 index
CN hijerarhija

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84199080 — EUDR referenca HS/CN područja primjene | EUDR Tools