Plates, sheets, film, foil and strip, of non-cellular polyethylene, printed, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. not printed stretch film, and polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photoresist film used in the manufacture of semiconductors or printed circuits)(2010-2500);Plates, sheets, film, foil and strip, of non-cellular polyethylene, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photo-resist film used in the manufacture of semiconductors or printed circuits)(1997-1997)

Il codice SA/NC 39201025 risulta fuori ambito per la preparazione EUDR.

Plates, sheets, film, foil and strip, of non-cellular polyethylene, printed, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. not printed stretch film, and polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photoresist film used in the manufacture of semiconductors or printed circuits)(2010-2500);Plates, sheets, film, foil and strip, of non-cellular polyethylene, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photo-resist film used in the manufacture of semiconductors or printed circuits)(1997-1997) Il motore di ambito indicizzato restituisce Out of scope per questo codice. No Annex I scope match was found for this indexed CN code.

Perché questa pagina di riferimento dà quella risposta.

Descrizione del codice

Plates, sheets, film, foil and strip, of non-cellular polyethylene, printed, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. not printed stretch film, and polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photoresist film used in the manufacture of semiconductors or printed circuits)(2010-2500);Plates, sheets, film, foil and strip, of non-cellular polyethylene, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photo-resist film used in the manufacture of semiconductors or printed circuits)(1997-1997)

Base nell'allegato I

Nessuna voce diretta nell'allegato I

Base della fonte

Regulation (EU) 2023/1115 Annex I and CN 2026 index

Righe superiori, inferiori e vicine.

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Che cosa significa per la preparazione.

Questa riga non attiva direttamente la raccolta di prove nel risultato di ambito attuale.