HS/KN-kode 84569910 er ikke omfattet til EUDR-forberedelse.
Focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devices Den indekserede anvendelsesområde-motor returnerer Out of scope for denne kode. No Annex I scope match was found for this indexed CN code.
Hvorfor denne referenceside giver dette svar.
- Kodebeskrivelse
- Focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devices
- Bilag I-grundlag
- Ingen direkte bilag I-post
- Kildegrundlag
- Regulation (EU) 2023/1115 Annex I and CN 2026 index
Overordnet, underordnet og nærliggende rækker.
Biblioteksvisningen er til referencenavigation. Brug tjekkeren, når du vil køre en anden kode som en handling.
84atomreaktorer; kedler; maskiner og apparater samt mekaniske redskaber; dele dertilout8456machine tools for working any material by removal of material, by laser or other light or photon beam, ultrasonic, electro-discharge, electro-chemical, electron beam, ionic-beam or plasma arc processes; water-jet cutting machines (excl. cleaning apparatus operated by ultrasonic processes, soldering and welding machines, incl. those which can be used for cutting, and material testing machines)out845699machine tools for working any material by removal of material, operated by electro-chemical processes or electron beam, ion beam or plasma arc processes (excl. for soldering and welding machines, materials testing machines and apparatus for-dry etching semiconductor materials)out84569930machine tools for stripping or cleaning semiconductor wafers by electro-chemical processes or electron beam, ion beam or plasma arc processesout84569950machine tools for dry-etching patterns on lcd substrates by electro-chemical processes or electron beam, ion beam or plasma arc processesout84569980machine tools for working any material by removal of material, operated by electro-chemical processes or electron beam, ion beam or plasma arc processes (excl. for soldering and welding machines, materials testing machines, focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devices, machine tools for dry-etching patterns on semiconductor materials and on lcd substrates, and apparatus for stripping or cleaning semiconductor wafers)out84569990machine-tools for working any material by removal of any material by electro-chemical processes or electron beam, ion beam or plasma arc processes (excl. for soldering and welding machines, materials testing machines, focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devices, machine-tools for dry- etching patterns on semi-conductor materials and apparatus for stripping or cleaning semiconductor wafers)out
Hvad dette betyder for forberedelsen.
Denne række udløser ikke direkte indsamling af dokumentation i det aktuelle anvendelsesområde-resultat.
Regulation (EU) 2023/1115 Annex I — relevant productshentet 2026-08-06Commission Delegated Regulation (EU) 2026/2102 amending Annex I to Regulation (EU) 2023/1115hentet 2026-09-24Eurostat Comext Combined Nomenclature codelist (CXT_NC v11.0)hentet 2026-08-06Eurostat Comext partner country codelist (CXT_FREE_ISO)hentet 2026-08-06Eurostat Comext DS-045409 — EU trade since 1988 by HS2-4-6 and CN8hentet 2026-08-06Commission Implementing Regulation (EU) 2025/1093 — country benchmarkinghentet 2026-08-06Regulation (EU) 2025/2650 amending Regulation (EU) 2023/1115 as regards certain obligations of operators and tradershentet 2025-12-26Commission Implementing Regulation (EU) 2026/1565 amending Implementing Regulation (EU) 2024/3084 (EUDR information system)hentet 2026-08-08