Įrankio rezultatasNepatenka į taikymo sritį
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Šiam indeksuotam CN kodui nerasta atitikties I priedo taikymo sričiai.
skirsnis - branduoliniai reaktoriai, katilai, mašinos ir mechaniniai įrenginiai; jų dalys
Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)
Reglamentas šiam kodui netaikomas. Šiam indeksuotam CN kodui nerasta atitikties I priedo taikymo sričiai.
Kodas 84199080Išvada Nepatenka į taikymo sritįCN 2026
Kuo remiasi tikrintuvas.
Produkto pavadinimasParts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)
Kodo keliasSKIRSNIS - BRANDUOLINIAI REAKTORIAI, KATILAI, MAŠINOS IR MECHANINIAI ĮRENGINIAI; JŲ DALYS
PagrindasReglamento (ES) 2023/1115 I priedas ir CN 2026 indeksas
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