Plates, sheets, film, foil and strip, of non-cellular polyethylene, printed, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. not printed stretch film, and polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photoresist film used in the manufacture of semiconductors or printed circuits)(2010-2500);Plates, sheets, film, foil and strip, of non-cellular polyethylene, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photo-resist film used in the manufacture of semiconductors or printed circuits)(1997-1997)

Il-kodiċi HS/NM 39201025 huwa barra mill-kamp ta’ applikazzjoni għat-tħejjija għall-EUDR.

Plates, sheets, film, foil and strip, of non-cellular polyethylene, printed, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. not printed stretch film, and polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photoresist film used in the manufacture of semiconductors or printed circuits)(2010-2500);Plates, sheets, film, foil and strip, of non-cellular polyethylene, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photo-resist film used in the manufacture of semiconductors or printed circuits)(1997-1997) Il-magna indiċizzata tal-kamp ta’ applikazzjoni tagħti Out of scope għal dan il-kodiċi. No Annex I scope match was found for this indexed CN code.

Għaliex din il-paġna ta’ referenza tagħti dik it-tweġiba.

Deskrizzjoni tal-kodiċi

Plates, sheets, film, foil and strip, of non-cellular polyethylene, printed, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. not printed stretch film, and polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photoresist film used in the manufacture of semiconductors or printed circuits)(2010-2500);Plates, sheets, film, foil and strip, of non-cellular polyethylene, not reinforced, laminated, supported or similarly combined with other materials, unworked or not further worked than surface-worked or only cut to square or rectangular shapes, of a thickness of <= 0,125 mm and of a specific gravity of < 0,94, n.e.s. (excl. polyethylene film of a thickness of >= 20 but <= 40 micrometres for the production of photo-resist film used in the manufacture of semiconductors or printed circuits)(1997-1997)

Bażi fl-Anness I

L-ebda entrata diretta fl-Anness I

Bażi tas-sors

Regulation (EU) 2023/1115 Annex I and CN 2026 index

Ringieli ġenituri, subordinati u viċini.

Il-veduta tal-librerija hija għan-navigazzjoni ta’ referenza. Uża l-verifikatur meta trid tiċċekkja kodiċi ieħor bħala azzjoni.

Xi jfisser dan għat-tħejjija.

Din ir-ringiela mhijiex skattatur dirett għall-ġbir tal-evidenza fir-riżultat attwali tal-kamp ta’ applikazzjoni.