GS/GN-code 84569930 is buiten het toepassingsgebied voor EUDR-voorbereiding.
Machine tools for stripping or cleaning semiconductor wafers by electro-chemical processes or electron beam, ion beam or plasma arc processes De geïndexeerde scope-engine geeft Out of scope terug voor deze code. No Annex I scope match was found for this indexed CN code.
Waarom deze referentiepagina dat antwoord geeft.
- Codeomschrijving
- Machine tools for stripping or cleaning semiconductor wafers by electro-chemical processes or electron beam, ion beam or plasma arc processes
- Grondslag in bijlage I
- Geen directe vermelding in bijlage I
- Brongrondslag
- Regulation (EU) 2023/1115 Annex I and CN 2026 index
Bovenliggende, onderliggende en nabijgelegen rijen.
De bibliotheekweergave dient voor referentienavigatie. Gebruik de checker wanneer u een andere code als actie wilt uitvoeren.
84kernreactoren, stoomketels, machines, toestellen en mechanische werktuigen, alsmede delen daarvanout8456machine tools for working any material by removal of material, by laser or other light or photon beam, ultrasonic, electro-discharge, electro-chemical, electron beam, ionic-beam or plasma arc processes; water-jet cutting machines (excl. cleaning apparatus operated by ultrasonic processes, soldering and welding machines, incl. those which can be used for cutting, and material testing machines)out845699machine tools for working any material by removal of material, operated by electro-chemical processes or electron beam, ion beam or plasma arc processes (excl. for soldering and welding machines, materials testing machines and apparatus for-dry etching semiconductor materials)out84569910focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devicesout84569950machine tools for dry-etching patterns on lcd substrates by electro-chemical processes or electron beam, ion beam or plasma arc processesout84569980machine tools for working any material by removal of material, operated by electro-chemical processes or electron beam, ion beam or plasma arc processes (excl. for soldering and welding machines, materials testing machines, focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devices, machine tools for dry-etching patterns on semiconductor materials and on lcd substrates, and apparatus for stripping or cleaning semiconductor wafers)out84569990machine-tools for working any material by removal of any material by electro-chemical processes or electron beam, ion beam or plasma arc processes (excl. for soldering and welding machines, materials testing machines, focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devices, machine-tools for dry- etching patterns on semi-conductor materials and apparatus for stripping or cleaning semiconductor wafers)out
Wat dit betekent voor de voorbereiding.
Deze rij is in het huidige scoperesultaat geen directe trigger voor bewijsverzameling.
Regulation (EU) 2023/1115 Annex I — relevant productsopgehaald op 2026-08-06Commission Delegated Regulation (EU) 2026/2102 amending Annex I to Regulation (EU) 2023/1115opgehaald op 2026-09-24Eurostat Comext Combined Nomenclature codelist (CXT_NC v11.0)opgehaald op 2026-08-06Eurostat Comext partner country codelist (CXT_FREE_ISO)opgehaald op 2026-08-06Eurostat Comext DS-045409 — EU trade since 1988 by HS2-4-6 and CN8opgehaald op 2026-08-06Commission Implementing Regulation (EU) 2025/1093 — country benchmarkingopgehaald op 2026-08-06Regulation (EU) 2025/2650 amending Regulation (EU) 2023/1115 as regards certain obligations of operators and tradersopgehaald op 2025-12-26Commission Implementing Regulation (EU) 2026/1565 amending Implementing Regulation (EU) 2024/3084 (EUDR information system)opgehaald op 2026-08-08