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Knjižnica področja uporabe HS/CN
Referenca kodejedrski reaktorji, kotli, stroji in mehanske naprave; njihovi deli

Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)

Datirana referenca za kodo HS/CN 84199080, njeno podlago za področje uporabe EUDR, hierarhijo CN, posledice za dokaze in povezane indeksirane vrstice.

Vrsta referenceZapis področja uporabe HS/CN
Odločitev o področju uporabeOut of scope
Posledica za uvoznikaSamo referenčna opomba
Leto CN2026
Referenčni odgovor

Koda HS/CN 84199080 je za pripravo na EUDR izven področja uporabe.

Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001) Indeksirani mehanizem za področje uporabe za to kodo vrne Out of scope. No Annex I scope match was found for this indexed CN code.

Podlaga področja uporabe

Zakaj ta referenčna stran poda tak odgovor.

Opis kode
Parts of machinery, plant and laboratory equipment, whether or not electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat-exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates, and of furnaces, ovens and other equipment of heading 8514)(2002-2005);Parts of machinery, plant and laboratory equipment, whether or non-electrically heated, for the treatment of materials by a process involving a change of temperature, and of non-electric instantaneous and storage water heaters, n.e.s. (excl. of heat exchange units for civil aircraft of subheading 8419.90.10, of sterilizers of subheading 8419.20.00, and of apparatus for rapid heating, for deposition and for physical deposition by electronic beam or evaporation on semiconductor wafers and for chemical vapour deposition on LCD substrates)(1998-2001)
Podlaga v Prilogi I
Ni neposrednega vnosa v Prilogi I
Izvorna podlaga
Regulation (EU) 2023/1115 Annex I and CN 2026 index
Hierarhija CN

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